Ultra Micro Nikkor 50mm F1.8 h

Ultra-Micro-Nikkor 50mm F1.8 h

Technology

Enables a number of reduction printings of minute image patterns on a photo-resist under h-line monochromatic lighting (wavelength 407.7 milli-micron, or g-line monochromatic lighting (wavelength 435.8 milli-micron), or a combination of both.
Mounted on a photo-repeater, the principal role of this lens is to produce chrome masks (for IC and LSI manufacture) by means of the step-and-repeat method.
Its large 14mm circle image area ideally suits it to the making of photomasks for large pattern unit LSI manufacturing processes.
With its standard 1/5 magnification, the lens guarantees resolving power of 650 lines/mm over a 14mm circle image area (10mm square), 800 lines/mm or more over a 10mm circle image area.

Specifications

Focal length 49.2mm
Max. aperture f/1.8
Min. aperture f/1.8 fixed
Lens construction 12 elements, 9 groups
Standard magnification 1/5X
Standard wavelength 435.8 milli-micron (g-line)
Standard wavelength 404.7 milli-micron (h-line)
Vignettings 0 %
Distortion 0.002 %
Aerical resolving power 650 lines/mm (14mm circle)
Aerical resolving power 800 lines/mm (10mm circle)
Image area 14 mm circle
Subject area 70mm circle
Overall working distance 315mm
Weight 700 g